(Author)Ĭombined evaluation of grazing incidence X-ray fluorescence and X-ray reflectivity data for improved profiling of ultra-shallow depth distributionsĮnergy Technology Data Exchange (ETDEWEB) Poor adhesion of the polymer onto the substrate yielded a limited number of thickness measurements made from the XRR profiles. For PVP, measured critical angle is lower than quartz. Sulfur fluorescent intensity derived from the TXRF measurement showed a linear relationship with the measured thickness by XRR. Thickness measurements of the prepared carrageenan thin films showed that concentration was the main determinant for final film thickness over the other process parameters. XRR profiles of carrageenan thin films yielded a mean value for the critical angle close to quartz substrate. For both carrageenan and PVP, an increase in concentration yielded a corresponding increase in intensity of the fluorescent or scattered peaks. Angle-dispersive total- reflection x-ray fluorescence spectroscopy profiles of three films showed film formation only in carrageenan and PVP. The thickness of the films were varied by varying the process parameters such as concentration, spin speed and spin time. Evaluation of the performance of this grazing incidence techniques was done by preparing polymer thin films of carboxymethylcellulose, carrageenan and polyvinylpyrrolidone (PVP). X-ray reflectometry was coupled with total- reflection x-ray fluorescence spectroscopy.
Alignment of a Philips x-ray powder diffractometer was improved to let it perform as an x-ray reflectometer. International Nuclear Information System (INIS)ĭevelopment of available x-ray characterizations tools for grazing incidence techniques was done to be able to probe nano-size thin films.
Surface characterization of selected polymer thin films by total- reflection x-ray fluorescence spectroscopy and x-ray reflectivity The theoretically calculated diffraction images agree very well with the observed images. Smaller structures were distorted by Fresnel-diffraction. The reflected patterns were projected (with an energy of 100 eV) onto a resist and structure sizes down to 8 micrometers were nicely reproduced. A double crystal X-ray monochromator was modified so as to allow about 0.5 sq cm of the reflection mask to be illuminated by white synchrotron radiation. The masks were tested at the synchrotron radiation laboratory of the electron accelerator ELSA. The multilayer mirrors were patterned by reactive ion etching with CF4 using a photoresist as etch mask, thus producing X-ray reflection masks. Mo/Si-multilayer mirrors with a 2d in the region of 14 nm were characterized by Cu-k(alpha) grazing incidence as well as soft X-ray normal incidence reflectivity measurements. SXPL (Soft X-ray Projection Lithography) multilayer mirrors are characterized, laterally structured and then used as reflection masks in a projecting lithography procedure. X ray reflection masks: Manufacturing, characterization and first tests High resolution aplanatic imaging X-ray microscopes using normal incidence multilayer X-ray mirrors should have many important applications in advanced X-ray astronomical instrumentation, X-ray lithography, biological, biomedical, metallurgical, and laser fusion research. The design of the microscope and the results of the optical system ray trace analysis are discussed. A doubly reflecting normal incidence multilayer imaging X-ray microscope based on the Schwarzschild configuration has been designed. The images indicated that aplanatic imaging soft X-ray/EUV microscopes should be achievable using multilayer optics technology. These instruments produced high spatial resolution images of the sun and conclusively demonstrated that doubly reflecting multilayer X-ray optical systems are feasible. Normal incidence multilayer Cassegrain X-ray telescopes were flown on the Stanford/MSFC Rocket X-ray Spectroheliograph. Design of a normal incidence multilayer imaging X-ray microscope
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